Fabrication of Nanometer-Sized Structures by C-NEMS Technology
K-S Ma, G-Y Jia, Q. Xu, H. Zhou, C-L Wang, J. Zoval and M. Madou
University of California, Irvine, US
nano wires, carbon NEMS, electron beam lithography, EBL, SU8
We have demonstrated a technique to fabricate carbon nano wires of controllable dimension and location using a top-down methodology. The width and thickness of the wires are in the tens of nanometer range. Additionally, the technique is capable to produce conducting carbon nano wires with addressable positioning, controllable length, high aspect ratio (length vs width) and alignment. The addressable and patternable carbon nano wires we developed can be exploited in large-scale assembly to make highly integrated nano wire sensor arrays or electronic devices.
Back to Program
Nanotech 2005 Conference Program Abstract