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Single and Multiwall Carbon Nanotube Deposition using Dedicated Microwave CVD System

R Gat, M.M. Maschmann, A. Goyal, Z. Iqbal and T.S. Fisher
Sekitechnotron USA, US

Keywords:
microwave plasma, carbon nanotube, single wall, multi wall

Abstract:
Microwave plasma enhanced CVD has reproducibly yielded Single-walled and Multiwalled carbon nanotubes. This development has provided access to new parameter space and an opportunity for better control over the nanotube properties. SWCNTs were grown at 600-800oC using a mix of methane and hydrogen gas. The catalyst was bimetallic Mo/Co supported on MgO and dispersed on a silicon wafer. MWCNT’s were characterized using spectroscopic ellipsometry. The impact of thermodynamic calculation and plasma chemistry on control of CNT properties will be presented.

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