FEI Company serves diverse nanotechnology markets with SEM, TEM, and DualBeam™ FIB/SEM instruments that enable advanced, three-dimensional characterization, analysis, metrology, prototyping, and diagnostics on nanoscale structures. Nova™ NanoLab DualBeam is ideal for machining, prototyping, characterization, and analysis of complex structures below 100 nm. New Nova NanoSEM enables high resolution imaging of non-conductive or contaminating materials commonly used in nanotechnology. Quanta 3D™ DualBeam offers high vac, low vac, and environmental SEM (ESEM)™ capabilities in an environment that also allows humidity cycling, stress/strain testing, and hot/cold stage experiments. Our Tecnai™ TEM series supports structural research applications with image resolution below 1 Ångström.
Nanotech 2005 Exhibitor Description