Nanometrix Inc. has developed a breakthrough system to make ultra-thin structured and oriented films (“Films”) ranging from 1 nanometer to 300 microns thickness.
Nanometrix is developing products, processes and services centered on its unique nanometric- and micrometric-scale monolayer or multi-layer Films made up of particles and molecules. These revolutionary ultra-thin Films will be used to create new products or optimize existing products and manufacturing processes in various industries.
Nanometrix has patented its process and machinery, and further patents are being developed. This is the only known process that can produce continuous, large-format 2-dimensional Films in production volumes.
A vital key is the company’s operating prototype machine that is now producing Films being evaluated by prospective customers. The Nanometrix MG-1™ process and machinery are orders-of-magnitude superior to other methods of ultra-thin film production. Other methods are complex batch processes, small scale, expensive, intrinsically unstable and non-uniform, or the processes warp, alter or destroy the substrate or sub-layers.
Nanometrix’s MG-1™ system has already fabricated production-quality samples of ultra-thin Films with the following characteristics:
- Outstanding uniformity of thickness and orientation;
- Production lengths up to hundreds of meters with widths up to 0.25 meters;
- A wide variety of thin film materials;
- Various flexible substrates;
- Multi-layering and post-curing.