Molecular Imprints, Inc.
Molecular Imprints, Inc.™ (MII), founded in 2001 in Austin, TX, designs, develops, manufactures and supports imprint lithography systems used for nano-device fabrication, compound semi devices, optical structures, nano structures, advanced packaging, data storage and MEMs/NEMs fabrications.
MII offers three lithography systems (All handle 2”-8” wafers):
Imprio™ 100: Sub-50nm resolution, sub-micron alignment and 3-D replication
Imprio 55: Sub-50nm resolution, micron alignment, and 3-D replication
Imprio 50: Sub-50nm resolution and 3-D replication
All three systems use the step and repeat technology (S-FIL™). This technology delivers a lower capital cost, low complexity alternative to expensive next generation optical lithography.