Raith USA, Inc.
NEW AND INNOVATIVE PRODUCTS FROM RAITH
Raith manufactures a variety of E-Beam Lithography systems for research and development applications designed to meet the needs of researchers, designers, and engineers in both university and industry settings. Our family of lithography products range from PC driven pattern generator attachments for SEMs or FIBs, to complete systems with full wafer and mask handling capabilities. The Raith 150 is a state of the art, high performance, ultra-high resolution lithography system with a 6-inch laser interferometer stage for accurate movement and placement of substrates and patterns. Based on the Gemini FE column, this turnkey system is the ideal solution for low volume production facilities and University Nanofabrication laboratories. A comprehensive, user friendly, operating system with built in GDSII Editor for pattern generation and intensive customer training program is included with this full “Turnkey” system.
Raith also manufactures ultra-high precision stages and navigation packages for failure analysis applications. The ESCOSYPlusisthenavigation solution for all your analytical tools featuring: Defect-Review, CAD navigation, Bit-Fail Map review and Metrology in one economical package. ASEMs (Application Specific SEMs) with specialized functions, such as reverse engineering or high-precision metrology, are examples of Raith expertise for design and manufacturing of advanced, leading edge, systems.