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Nano Science and Technology Institute 2004 NSTI Nanotechnology Conference & Trade Show
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Molecular Imprints

N. Schumaker
Molecular Imprints, US

Keywords: S-FIL Technology, nano lithography, nano-imprinting

Abstract:
Molecular Imprints, Incorporated (MII) is developing and manufacturing nano-lithography systems for high resolution and for 3-dimensional pattern replication. The company has commercialized a new and unique Step and Flash Imprint Lithography technology called S-FIL(TM), which is a simple step and repeat, room temperature, low pressure, nano-imprint process that has demonstrated sub-20 nanometer resolution. Molecular Imprints provides enabling lithography systems and technology for manufacturing applications in the areas of: nano-devices, micro structures, advanced packaging, bio-devices, optical components and semiconducting devices. MII's Imprio(TM) product family is a cost-effective substitute for next generation lithography systems, at a fraction of the price.

Nanotech 2004 Conference Technical Program Abstract

 
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