Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology

J.A. Dagata, C.A. Richter, R.M. Silver, E. Vogel and J.V. Martinez de Pinillos
NIST, US

Keywords: nanolithography, thin films, gate dielectrics, nanoelectronics, molecular electronics

Abstract:
The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentation will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.

Nanotech 2004 Conference Technical Program Abstract