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Using Topology Derived Masks to Facilitate 3D Design

R. Schiek and R. Schmidt
Sandia National Laboratories, US

Keywords: topology, mask, MEMS, design, optimization

Abstract:
To accelerate MEMS design for surface micromachining applications, an algorithm and associated design tool have been created which translates designers' 3D models into 2D lithographic production masks. Typically, designing a surface micromachined, MEMS device requires the creation of a two-dimensional mask set describing how layers of material are used to construct the three-dimensional object. Mask sets are specific to a fixed production process and are effectively the tooling required to manufacture a device. This design tool was developed and implemented such that when given a three-dimensional object it can infer from the object's topology the two-dimensional masks needed to produce that object with surface micromachining. The masks produced by this design tool can be generic, process independent masks or, if given process constraints, specific for a target process allowing 3D designs to be carried across multiple processes.

Nanotech 2004 Conference Technical Program Abstract

 
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